Molecular Formula: Al(CH3)3
Molecular Weight: 72.09
Physical and Chemical Properties:
A clear and colorless liquid.
Melting Point: 15℃
Boiling Point: 127℃
Ignites when exposed to air. Reacts violently with alcohol, acid or water of which molecular structure has an active hydrogen group. Miscible with Aliphatic Hydrocarbons, such as Hexane and Heptane, and Aromatic Hydrocarbons, such as Toluene and xylene.
Used to form Al2O3 passivation layers through PECVD or ALD in photovoltaic Industry. Also used for the deposition of high-k dielectric films, such as Al2O3, in semiconductor process. An important metal-organic source to form Aluminum semiconductors, such as AlAs, AlN, AlP, AlSb, AlGaAs, AlInGaAs, AlInGaP, AlGaN, AlInGaN and AlInGaNP, through MOCVD (Metal Organic Chemical Vapor Deposition) process.
Container Material: Stainless Steel EP 316 L
Valve Type: 1/4’’ diaphragm valve.
Valve Material: Stainless Steel 316 L
Valve Connection: 1/4’’ VCR
Net Weight: 14.2 kg, 72 kg and 300 kg
Rainer WoltersSales Manager