Tetraethyl Orthosilicate (TEOS)
Chemical Formula: Si(C2H5O)4
Molecular Weight: 208.33
Physical & Chemical Properties
Appearance: apparently colorless liquid
Melting point: -77 ℃
Boiling point: 169 ℃
Relative density: 0.9346 g/ml
Stable in air. Slightly soluble in water. Hydrolyze very slowly in pure water. Acid or base can speed up its hydrolyzation.
Primarily used in the chemical vapor deposition (CVD) process of wafer fab to form Silicon Dioxide (SiO2) film.
An important electronic chemical needed for the manufacturing of semiconductors, discrete devices and MEMS products.
Container: Stainless Steel Cylinder.
Packaging: Stainless Steel Cabinet.
Fill volume: 2 gallons,5 gallons (19 L),10 gallons, 200 L.